Lampard Unit
Lampard Unit
Rapid heating and high-precision temperature distribution achieved with the lamp R unit. 【Features】 ○ Utilizes high-output infrared lamp heaters in a circular shape to heat the substrate from both above and below, achieving rapid heating and high-precision temperature distribution. ○ Employs a cooling reflective plate with a special surface treatment on the inner surface of the chamber, enabling excellent process reproducibility and rapid cooling. ○ Processing substrate: φ300mm ○ Maximum operating temperature: 1000±10℃ ● For other functions and details, please download the catalog.
- 企業：メープル
- 価格：Other
